Focused Ion Beam System for Nano Fabrication and Application
Introduction
ITRC provides nano-scale components fabrication service. The focused ion beam system established by ITRC integrates the functions of SEM and gas injection system (GIS) to enhance the capability in nano structure (component) fabrication. Ion beam with 5 nm − 10 nm in diameter has been applied to deposit or etch suspended nano/micro structures. Direct writing technology is capable of producing surface plasmon enhanced device and AFM tip. The fabricated metal array structures, nano antennas and super lenses are planned for further optical property measurements.
Main Specifications
- Image resolution:1.5 nm (e-beam)
- 7 nm (i-beam)
- Ion beam etching limit:30 nm
- Pt deposition limit:25 nm (e-beam)
- 100 nm (i-beam)
Technical Achievements
Applications
- MEMS
- Material analysis
- SEM/TEM sample fabrication
- Photonics
- Communication
2009/8/14 updated
